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3.
Electronic Article

New model for boron diffusion in silicon : Neues Modell fuer Bor-Diffusion in Silizium

for Applied Physics Letters | Vol. 28, No. 4 (1976), p. 184-186
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5.
Electronic Article

The nature of precipitates in boron-doped ti c

for Philosophical Magazine | Vol. 16, No. 143 (1967), p. 873-890
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7.
Electronic Article

Lattice disorder in ion-implanted boron-doped silicon

for Applied Physics Letters | Vol. 19, No. 1 (1971), p. 14-16
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