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4.
Electronic Article

Diffusion of interstitials in metallic systems, illustration of a complex study case: aluminum

for Journal of Physics: Condensed Matter | Vol. 29, No. 45 (2017), p. 455703/1-10
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7.
Electronic Article

Properties of boron-rich layer formed by boron diffusion in n-type silicon

for Thin Solid Films | Vol. 564 (2014), p. 253-257
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9.
Electronic Article

Role of a Si0.95Ge0.05 epilayer cap on boron diffusion in silicon under inert and dry oxidizing ambient annealing

for Materials Science in Semiconductor Processing | Vol. 48 (2016), p. 60-64
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10.
Electronic Article

An investigation of material design for gettering

for ECS Transactions | Vol. 16, No. 6 (2008), p. 267-272
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