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2.
Article

Nucleation of oxygen precipitates in Czochralski-grown silicon = : Die Nukleation von Sauerstoff-Niederschlaegen in nach der Czochralski-Methode gewachsenen Silizium

for 1st Int. Autumn School 1985. Gettering and Defect Engineering in the Semiconductor Technology. Proc., Garzau, DDR | (1985), p. 174-182
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3.
Electronic Article

Removal of Boron and Phosphorus from Silicon Using CaO-SiO2-Na2O-Al2O3 Flux

for Metallurgical and Materials Transactions B, Process Metallurgy and Materials Processing Science | Vol. 45, No. 1 (2014), p. 221-228
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4.
Electronic Article

Germanium Junctions for Beyond-Si Node Using Flash Lamp Annealing (FLA)

for MRS Advances, Electronic Devices and Materials | Vol. 2, No. 51 (2017), p. 2921-2926
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6.
Electronic Article

Behavior of ions in Si1O2 : Verhalten von Ionen in Si1O2

for Journal of Vacuum Science and Technology | Vol. 11, No. 6 (1974), p. 1025-1027
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7.
Article

Characterization of semiconductor silicon using FT-IR spectroscopy = : Charakterisierung von Halbleiter-Silicium durch FT-IR-Spektroskopie

for Proc. of SPIE. Spectroscopic Characterization Techniques for Semiconductor Technology | Vol. 452 (1984), p. 71-78
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