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1.
Article

Double catcher plates in the reactive ion etching = : Doppel-Fangteller in Ionenaetzsystemen

for IBM Technical Disclosure Bulletin | Vol. 26, No. 11 (1984), p. 5881-5882
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3.
Electronic Article

Improving sidewall roughness by combined RIE-Bosch process

for Materials Science in Semiconductor Processing | Vol. 83 (2018), p. 186-191
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6.
Electronic Article

A four level silicon microstructure fabrication by DRIE

for Journal of Micromechanics and Microengineering | Vol. 26, No. 8 (2016), p. 084003/1-9
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7.
Electronic Article

Sensor assembly method using silicon interposer with trenches for three-dimensional binocular range sensors

for Japanese Journal of Applied Physics (JJAP) | Vol. 57, No. 4S (2018), p. 04FF07/1-6
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10.
Electronic Article

Mechanism of reducing line edge roughness in ArF photoresist by using CF3I plasma

for Journal of Vacuum Science and Technology, Part B (Microelectronics and Nanometer Structures) | Vol. 27, No. 5 (2009), p. 2117-2123
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