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Inexpensive substrate heater for oxidizing environments

We describe a substrate heater constructed for use in an oxidizing environment in the temperature range of T≤900 °C. The heating element is an ordinary projection lamp working in ambient near the end of a quartz tube fixed with a flange to a vacuum chamber. On the vacuum (outer) side of the tube is... Full description

Contributors: Paturi, P.
Huhtinen, H.
Laiho, R.
Sekundärausgabe Online edition, AIP Digital Archive ; 041004-4
Contained in: Review of Scientific Instruments : a monthly journal devoted to scientific instruments, apparatus, and techniques [S.l.] : American Institute of Physics Vol. 69, No. 11 (1998), p. 3945-3947
Journal Title: Review of Scientific Instruments : a monthly journal devoted to scientific instruments, apparatus, and techniques
Fulltext access: Fulltext access (direct link*) 10.1063/1.1149203
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Links: Additional Link (dx.doi.org)
ISSN: 1089-7623
DOI: 10.1063/1.1149203
Language: English
Physical Description: Online-Ressource
ID (e.g. DOI, URN): 10.1063/1.1149203
aip20081121000129624
PPN (Catalogue-ID): NLEJ219430888
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520 |a We describe a substrate heater constructed for use in an oxidizing environment in the temperature range of T≤900 °C. The heating element is an ordinary projection lamp working in ambient near the end of a quartz tube fixed with a flange to a vacuum chamber. On the vacuum (outer) side of the tube is a smooth fitting stainless steel cylinder that conducts the heat to the region of the substrate. For fixing or removing the substrate the cylinder can be simply pulled off its position on the quartz tube. The heater that is described has been used, for example, for laser ablation of YBa2Cu3O6+x superconducting films. © 1998 American Institute of Physics. 
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